STS Vision 310 Mark II PECVD System

STS Vision 320 Mark II PECVD SystemThe STS Vision 310 Plasma Enhanced Chemical Vapor Deposition system is equipped with a patented frequency generator (500W at 187 kHz and 300W at 13.56 MHz) that allows for the deposition of low stress films. It is configured for the growth of silicon dioxide, silicon nitride, and amorphous silicon. Available gases are 2% silane/nitrogen, ammonia, nitrous oxide, tetrafluoromethane, oxygen, and nitrogen. The sample plate can accommodate substrates up to 305 mm in diameter with a 250 mm diameter growth area, and has temperature control from 30ºC to 380ºC. Opening and closing of the chamber is automatic via a pnematically controlled hoist mechanism. Basic standard growth recipes are available.

Hourly rates are applied for the use of this tool. Please use the Lab scheduler to reserve time.

UMass Facility Online Manager