CHA Electron Beam Evaporator with Cryopump

CHA Electron Beam Evaporoator with Cryopump

The CHA SE-600 electron beam evaporator with a 4 pocket hearth has been retrofitted with a cryopump to decrease the pumping cycle time. Current deposition metals available include gold, germanium, nickel, chromium, cobalt, iron, nickel-iron, copper, aluminum, palladium, silver, platinum, niobium, and titanium. Fixed position substrate holders are available to fit single wafers of any size and up to eighteen 3" diameter wafers at one time. Substrate rotation is currently not available.

Hourly rates are applied for the use of this tool. Please use the Lab Scheduler to reserve time.

Available materials are: Au, Cr, Ti, Ni, Al, Ag, Cu, NiFe, Co, Pd, Fe, Pt, Nb, and Ge.

 

http://nano.pse.umass.edu/scheduler/index.php